Concepedia
Statistics
Publications
8
Citations
177
H-Index
Active since
1994
Affiliations
AT&T (United States)(Current)
University of Illinois Urbana-Champaign
Masis M. Mkrtchyan is an author at AT&T (United States) specializing in engineering, physics, and applied physics.
Top concepts
PhysicsMicroscopyEngineeringApplied PhysicsParticle Beam PhysicsInstrumentationOptoelectronicsNatural SciencesOptical PropertiesElectron Cloud Effects
Publications per year
1994–2001
Stochastic scattering in charged particle projection systems: A nearest neighbor approach
Masis M. Mkrtchyan, J. Alexander Liddle, S. D. Berger et al. · Journal of Applied Physics · 1995 · 41 citations
Engineering, Nuclear Physics, Electron-beam Lithography +26
Space charge effects in projection charged particle lithography systems
L. R. Harriott, S. D. Berger, Joyce Liddle et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 32 citations
Ion Projection System, Space Charge, Engineering +18
Electron scattering and transmission through SCALPEL masks
Masis M. Mkrtchyan, J. Alexander Liddle, Anthony E. Novembre et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 23 citations
Materials Science, Electron Scattering, Engineering +13
The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System
J. Alexander Liddle, Steven D. Berger, C. J. Biddick et al. · Japanese Journal of Applied Physics · 1995 · 21 citations
Engineering, Electron-beam Lithography, Physics +12
An analytical model of stochastic interaction effects in projection systems using a nearest-neighbor approach
Masis M. Mkrtchyan, J. Alexander Liddle, S. D. Berger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 20 citations
Engineering, Nuclear Physics, Electron-beam Lithography +28
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