Anthony E. Novembre

Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

Elsa Reichmanis, Omkaram Nalamasu, Francis M. Houlihan et al. · Polymer International · 1999 · 41 citations

Short Wavelength Optic, Optical Materials, Engineering +24

Electron scattering and transmission through SCALPEL masks

Masis M. Mkrtchyan, J. Alexander Liddle, Anthony E. Novembre et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 23 citations

Materials Science, Electron Scattering, Engineering +13

Measurement of the backscatter coefficient using resist response curves for 20–100 keV electron beam lithography on Si

G. P. Watson, Diana Fu, Steven D. Berger et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 23 citations

Electrical Engineering, Engineering, Electron-beam Lithography +13

Lithographic Resist Materials Chemistry

Elsa Reichmanis, Anthony E. Novembre · Annual Review of Materials Science · 1993 · 22 citations

Materials Engineering, Room Temperature, Materials Science +8

Tungsten patterning for 1:1 x-ray masks

C. W. Jurgensen, R. R. Kola, Anthony E. Novembre et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 21 citations

Engineering, Electron-beam Lithography, W Sidewall +20