Journal of Photopolymer Science and Technology · 2004 · 17 citations · 11 references
Natural SciencesMaterials EngineeringMaterials SciencePolymer ChemistryPolymer EngineeringPolymer MaterialsAcrylic Resin MaterialsPolymer CharacterizationPolymer Physical ChemistryPolymer StructurePolymer Thin FilmsLine Edge Roughness AnalysisLine RoughnessLine-edge RoughnessResist PatterningResist Sensitivity
We have investigated effects of alkoxy-methyl ester as acid labile protecting group on resists characteristics of acryl polymers for the designing of chemical amplification positive-tone resist system. Preparing 2-adamantyloxy methyl methacrylate (AdOMMA) copolymers and resists consisted of these polymer, we have evaluated copolymers properties, exposure sensitivities, resolution, and line edge roughness (LER). AdOMMA copolymers showed a good pattern profile and high resolution. In addition, as compared with 2-methyl-2-admantyl methacrylate (MAdMA) copolymers, AdOMMA copolymers displayed a good LER of 130 nm resist lines, and the observed LER values were 7.6 nm and 5.6 nm, respectively.
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Influence of edge roughness in resist patterns on etched patterns
Hideo Namatsu, Masao Nagase, Toru Yamaguchi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 111 citations
Natural Sciences, Materials Engineering, Materials Science +16
Thomas I. Wallow, Francis M. Houlihan, Omkaram Nalamasu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 34 citations
A Novel Polymer for a 193-nm Resist.
Koji Nozaki, Keiji Watanabe, Ei Yano et al. · Journal of Photopolymer Science and Technology · 1996 · 34 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +16