Concepedia
Statistics
Publications
22
Citations
471
H-Index
13
Active since
2000
Affiliations
Tokyo Ohka Kogyo (Japan)(Current)
Hitachi (Japan)
Association of Super-Advanced Electronics
Himeji University
University of Hyogo
Hideo Hada is an author at Tokyo Ohka Kogyo (Japan) specializing in materials science, natural sciences, and materials engineering.
Publications per year
2000–2009
New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
Taku Hirayama, Daiju Shiono, Hideo Hada et al. · Journal of Photopolymer Science and Technology · 2004 · 62 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +12
Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance
Atsuko Yamaguchi, Hiroshi Fukuda, Tadashi Arai et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 44 citations
Engineering, Electrical Engineering, Materials Science +17
Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
Taku Hirayama, Daiju Shiono, Shogo Matsumaru et al. · Japanese Journal of Applied Physics · 2005 · 39 citations
Natural Sciences, Materials Engineering, Materials Science +17
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
Takeo Watanabe, Hiroo Kinoshita, Hajime Nii et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 37 citations
Natural Sciences, Materials Engineering, Materials Science +9
Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists
Yoshiyuki Utsumi, Takehiro Seshimo, Yoshitaka Komuro et al. · Japanese Journal of Applied Physics · 2009 · 29 citations
Natural Sciences, Materials Engineering, Materials Science +13
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