Yoshiyuki Utsumi

Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists

Yoshiyuki Utsumi, Takehiro Seshimo, Yoshitaka Komuro et al. · Japanese Journal of Applied Physics · 2009 · 29 citations

Materials Science, Chemical Engineering, Optical Materials +14

Perpendicular orientation control in thin films of POSS-containing block copolymer domains with a top-coat surface treatment

Takehiro Seshimo, Yoshiyuki Utsumi, Takahiro Dazai et al. · Polymer Journal · 2016 · 18 citations · Full text

Materials Science, Top-coat Surface Treatment, Perpendicular Orientation Control +10

Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography

Yoshitaka Komuro, Hiroki Yamamoto, Kazuo Kobayashi et al. · Japanese Journal of Applied Physics · 2014 · 16 citations

Engineering, Electron-beam Lithography, Chemistry +18

Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography

Yoshitaka Komuro, Hiroki Yamamoto, Yoshiyuki Utsumi et al. · Applied Physics Express · 2013 · 12 citations

Engineering, Electron-beam Lithography, Chemistry +21

Progress of topcoat and resist development for 193nm immersion lithography

Katsumi Ohmori, Tomoyuki Ando, Toshikazu Takayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 12 citations

Engineering, Electron-beam Lithography, Polymer Nanocomposites +23