New Photoresist Based on Amorphous Low Molecular Weight Polyphenols

Taku Hirayama, Daiju Shiono, Hideo Hada, +2

Journal of Photopolymer Science and Technology

Materials SciencePhenol GroupsChemical EngineeringPolymer MaterialEngineering +12

Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance

Atsuko Yamaguchi, Hiroshi Fukuda, Tadashi Arai, +5

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyTransistor PerformanceResistorBeam Lithography +14

Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists

Taku Hirayama, Daiju Shiono, Shogo Matsumaru, +9

Japanese Journal of Applied Physics

Materials ScienceChemical EngineeringEngineeringDissolution RateElectron-beam Lithography +12

Performance of molecular resist based on polyphenol in EUV lithography

Hiroaki Oizumi, Fumiaki Kumasaka, Yuusuke Tanaka, +6

Microelectronic Engineering

Materials EngineeringMaterials ScienceEngineeringSpecific ResistanceElectron-beam Lithography +9

Evaluation of New Molecular Resist for EUV Lithography

Hiroaki Oizumi, Yuusuke Tanaka, Takaaki Kumise, +6

Journal of Photopolymer Science and Technology

Materials ScienceMaterials EngineeringOptical MaterialsNew Molecular ResistEngineering +13

Depth profile and line‐edge roughness of partially <i>O</i>‐1‐ethoxyethylated low molecular weight amorphous polyphenol and poly(<i>p</i>‐hydroxystyrene) base resists for electron‐beam lithography

Taku Hirayama, Daiju Shiono, Junichi Onodera, +2

Polymers for Advanced Technologies

Materials ScienceChemical EngineeringDissolution Rate DistributionDissolution RateEngineering +13

Photocrosslinkable azo‐dye polymers for second‐order nonlinear optics

Masao Kato, Taku Hirayama, Hiro Matsuda, +3

Macromolecular Rapid Communications

PhotonicsOptical MaterialsEngineeringNonlinear OpticsOptical Properties +5

Limitation of blend type of resist platform on EUV lithography

Taku Hirayama, Su Min Kim, Hai Sub Na, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyChemical EngineeringResistorBeam Lithography +15

Negative-Tone Polyphenol Resist using Intramolecular-Esterification Reaction for sub-50 nm Lithography

K. Kojima, Takashi Hattori, Hiroshi Fukuda, +4

Journal of Photopolymer Science and Technology

Optical MaterialsEngineeringPhoto Acid GeneratorsElectron-beam Lithography3M6c-mbsa-bl Resist +18

Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography

Hideo Hada, Taku Hirayama, Daiju Shiono, +4

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyChemistryEnvironmental PhotochemistryExtreme Ultraviolet +18