Concepedia

Performance of molecular resist based on polyphenol in EUV lithography

Hiroaki Oizumi, Fumiaki Kumasaka, Yuusuke Tanaka, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera, Atsuko Yamaguchi, Iwao Nishiyama

Microelectronic Engineering · 2006 · 28 citations · 27 references

DOI

Concepts

References

27

Size-Dependent Depression of the Glass Transition Temperature in Polymer Films

Joseph L. Keddie, Richard Jones, Rachel A. Cory · Europhysics Letters (EPL) · 1994 · 1.8K citations

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In This Volume

John Lee Hooker · Journal of Business Ethics Education · 2012 · 536 citations

Surface Molecular Motion of the Monodisperse Polystyrene Films

Tisato Kajiyama, Keiji Tanaka, Atsushi Takahara · Macromolecules · 1997 · 323 citations

, , +17

Ultrahigh resolution of calixarene negative resist in electron beam lithography

Jun‐ichi Fujita, Y. Ohnishi, Yukinori Ochiai et al. · Applied Physics Letters · 1996 · 242 citations

, , +14

Mobility of Polymers in Films Thinner than Their Unperturbed Size

Günter Reiter · Europhysics Letters (EPL) · 1993 · 210 citations

, , +16