Growth of regularly coiled carbon filaments by Ni catalyzed pyrolysis of acetylene, and their morphology and extension characteristics

Seiji Motojima, Masayuki Kawaguchi, Koji Nozaki, +1

Applied Physics Letters

Materials ScienceExtension CharacteristicsEngineeringPyrolytic CarbonCatalysis +5

Preparation of coiled carbon fibers by catalytic pyrolysis of acetylene, and its morphology and extension characteristics

Seiji Motojima, Masayuki Kawaguchi, Koji Nozaki, +1

Carbon

Materials ScienceCoiled Carbon FibersChemical EngineeringExtension CharacteristicsEngineering +4

A growth mechanism of regularly coiled carbon fibers through acetylene pyrolysis

Masayuki Kawaguchi, Koji Nozaki, Seiji Motojima, +1

Journal of Crystal Growth

Materials ScienceCarbonizationFiber SpinningGrowth MechanismCarbon Fibers +1

Total syntheses of (+)-thyrsiferol, (+)-thyrsiferyl 23-acetate, and (+)-venustatriol

Masaru Hashimoto, Toshiyuki Kan, Koji Nozaki, +3

The Journal of Organic Chemistry

Bioorganic ChemistryEngineeringChemical AnalysisAltmetric Attention ScoreOrganic Chemistry +14

Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

Yuko Kaimoto, Koji Nozaki, Satoshi Takechi, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Alicyclic PolymerEngineeringElectron-beam LithographyNovolac ResistKrf Excimer Lithography +19

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

Satoshi Takechi, Makoto Takahashi, Akiko Kotachi, +3

Journal of Photopolymer Science and Technology

Materials ScienceCleavable Adamantyl EsterBiofunctional MaterialHigh ResolutionEngineering +11

A Novel Polymer for a 193-nm Resist.

Koji Nozaki, Keiji Watanabe, Ei Yano, +3

Journal of Photopolymer Science and Technology

Materials ScienceEngineeringElectronic MaterialsHigh SensitivityElectron-beam Lithography +13

Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist

Koji Nozaki, Yuko Kaimoto, Makoto Takahashi, +2

Chemistry of Materials

EngineeringChemical AnalysisLaser ApplicationsAltmetric Attention ScoreLaser Material +14

Photoluminescence characteristics of BN(C, H) prepared by chemical vapour deposition

Masayuki Kawaguchi, Koji Nozaki, Yasushi Kita, +1

Journal of Materials Science

Chemical EngineeringPhotoluminescenceEngineeringBoron NitrideHexagonal Boron Nitride +5

New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists.

Koji Nozaki, Ei Yano

Journal of Photopolymer Science and Technology

EngineeringThf PolarityMevalonic LactoneResponsive PolymersChemistry +14