Yuko Kaimoto

Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

Yuko Kaimoto, Koji Nozaki, Satoshi Takechi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1992 · 59 citations

Natural Sciences, Materials Engineering, Materials Science +10

Reduction of line edge roughness in the top surface imaging process

Shigeyasu Mori, Taku Morisawa, Nobuyuki Matsuzawa et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 45 citations

Engineering, Materials Engineering, Materials Science +17

Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist

Koji Nozaki, Yuko Kaimoto, Makoto Takahashi et al. · Chemistry of Materials · 1994 · 32 citations

Natural Sciences, Chemistry, Materials Science +6

<title>Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography</title>

Makoto Takahashi, Satoshi Takechi, Yuko Kaimoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +6

Lithographic characteristics of alicyclic polymer based ArF single layer resists.

Makoto Takahashi, Satoshi Takechi, Koji Nozaki et al. · Journal of Photopolymer Science and Technology · 1994 · 16 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +7