Satoshi Takechi - Concepedia

Author

Satoshi Takechi

Fujitsu (Japan)

Also Known As

S. Takechi, SATOSHI TAKECHI, Satoshi Takechi

Publications

243

Citations

H-Index

Concepts

All Affiliations

Fujitsu (Japan)Fujitsu (China)

About

Satoshi Takechi is an author at Fujitsu (Japan) specializing in chemistry, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	186
2	Chemistry	5	5	186
3	Applied Physics	3	3	112
4	Chemical Engineering	2	2	51
5	Materials Engineering	1	1	19

Satoshi Takechi

Publications

226

Citations

H-Index

Page 1

	Year	Citations
Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification Yuko Kaimoto, Koji Nozaki, Satoshi Takechi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Alicyclic PolymerEngineeringElectron-beam LithographyNovolac ResistKrf Excimer Lithography	1992	59
Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist Satoshi Takechi, Makoto Takahashi, Akiko Kotachi, Journal of Photopolymer Science and Technology Materials ScienceCleavable Adamantyl EsterBiofunctional MaterialHigh ResolutionEngineering	1996	42
A Novel Polymer for a 193-nm Resist. Koji Nozaki, Keiji Watanabe, Ei Yano, Journal of Photopolymer Science and Technology Materials ScienceEngineeringElectronic MaterialsHigh SensitivityElectron-beam Lithography	1996	34
Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist Koji Nozaki, Yuko Kaimoto, Makoto Takahashi, Chemistry of Materials EngineeringChemical AnalysisLaser ApplicationsAltmetric Attention ScoreLaser Material	1994	32
<title>Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography</title> Makoto Takahashi, Satoshi Takechi, Yuko Kaimoto, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyChemistryMolecular Polymer193-Nm Lithography	1995	19
Lithographic characteristics of alicyclic polymer based ArF single layer resists. Makoto Takahashi, Satoshi Takechi, Koji Nozaki, Journal of Photopolymer Science and Technology	1994	16
Approach to high-aspect-ratio patterning using cleavable adamantyl resist Satoshi Takechi, Akiko Kotachi, Makoto Takahashi, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	1997	13
Study of ArF resist material in terms of transparency and dry etch resistance. Naomichi Abe, Satoshi Takechi, Yuko Kaimoto, Journal of Photopolymer Science and Technology	1995	11

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