Satoshi Takechi

Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

Yuko Kaimoto, Koji Nozaki, Satoshi Takechi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1992 · 59 citations

Alicyclic Polymer, Engineering, Electron-beam Lithography +21

Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist

Satoshi Takechi, Makoto Takahashi, Akiko Kotachi et al. · Journal of Photopolymer Science and Technology · 1996 · 42 citations · Full text

Materials Science, Cleavable Adamantyl Ester, Biofunctional Material +13

A Novel Polymer for a 193-nm Resist.

Koji Nozaki, Keiji Watanabe, Ei Yano et al. · Journal of Photopolymer Science and Technology · 1996 · 34 citations · Full text

Materials Science, Engineering, Electronic Materials +15

Molecular Design and Synthesis of 3-Oxocyclohexyl Methacrylate for ArF and KrF Excimer Laser Resist

Koji Nozaki, Yuko Kaimoto, Makoto Takahashi et al. · Chemistry of Materials · 1994 · 32 citations

Engineering, Chemical Analysis, Laser Applications +16

<title>Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography</title>

Makoto Takahashi, Satoshi Takechi, Yuko Kaimoto et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 19 citations

Engineering, Electron-beam Lithography, Chemistry +16