Journal of Applied Physics · 1998 · 79 citations · 23 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsInterface ScienceSemiconductor MaterialsSemiconductor HeterostructuresSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesWide-bandgap SemiconductorsX-ray Photoelectron SpectroscopyAluminum Gallium NitrideGallium NitrideGallium Nitride (Gan) MaterialsHeterojunction InterfacesHeterojunctionsHeterostructuresSemiconductor HeterojunctionsUltraviolet Photoelectron Spectroscopy
X ray and ultraviolet photoelectron spectroscopies have been used to determine the heterojunction valence band discontinuity at the (0001) GaN/AlN interface. Type I discontinuity values of 0.5±0.2 eV were determined for GaN grown on AlN at 650 °C and 0.8±0.2 eV for GaN grown on AlN at 800 °C. These values are critically evaluated with respect to film quality, the results of other experimental studies, and theory.
23
E. A. Kraut, R. W. Grant, J. R. Waldrop et al. · Physical Review Letters · 1980 · 1.5K citations
Natural Sciences, Materials Engineering, Materials Science +17
Emerging gallium nitride based devices
S. Noor Mohammad, A. Salvador, H. Morkoç̌ · Proceedings of the IEEE · 1995 · 614 citations