Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor

New Phenomena of Charge Damage in Plasma Etching: Heavy Damage Only through Dense-Line Antenna

Kouichi Hashimoto · Japanese Journal of Applied Physics · 1993 · 174 citations

Engineering, Electrical Engineering, Materials Science +14

Radiation Damage in SiO₂/Si Induced by VUV Photons

Takashi Yunogami, Tatsumi Mizutani, Keizô Suzuki et al. · Japanese Journal of Applied Physics · 1989 · 132 citations

Engineering, Materials Science, Physics +17

The Analysis of Dark Signals in the CMOS APS Imagers From the Characterization of Test Structures

H.I. Kwon, In Man Kang, Bumjin Park et al. · IEEE Transactions on Electron Devices · 2004 · 115 citations

Engineering, Computer Engineering, Electrical Engineering +17

Radiation Damage of SiO₂ Surface Induced by Vacuum Ultraviolet Photons of High-Density Plasma

Tetsuya Tatsumi, Seiichi Fukuda, S. Kadomura · Japanese Journal of Applied Physics · 1994 · 94 citations

Natural Sciences, Electrical Engineering, Materials Science +17

Modeling oxide thickness dependence of charging damage by plasma processing

Hang‐Sik Shin, Ko Noguchi, Chenming Hu · IEEE Electron Device Letters · 1993 · 71 citations

Engineering, Electrical Engineering, Physics +17