Chang-Jin Kang

Effects of various plasma pretreatments on 193nm photoresist and linewidth roughness after etching

Myeong-Cheol Kim, Denis Shamiryan, Youngjae Jung et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +16

Investigation of ultra thin polycrystalline silicon channel for vertical NAND flash

Bio Kim, Seunghyun Lim, Dong Woo Kim et al. · 2011 · 35 citations

Engineering, Electrical Engineering, Materials Science +17

High temperature platinum etching using Ti mask layer

Hyoun-Woo Kim, Byong-Sun Ju, B.Y. Nam et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 28 citations

Engineering, Materials Engineering, Materials Science +17

Chamber maintenance and fault detection technique for a gate etch process via self-excited electron resonance spectroscopy

Kye Hyun Baek, Youngjae Jung, Gyung Jin Min et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 25 citations

Engineering, Electrical Engineering, Physics +17

High-rate Ru electrode etching using O2/Cl2 inductively coupled plasma

Hyoun Woo Kim, Byong-Sun Ju, Chang-Jin Kang · Microelectronic Engineering · 2003 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +11