Concepedia
Microelectronic Engineering · 2003 · 23 citations · 8 references
Natural SciencesMaterials EngineeringMaterials ScienceElectrochemistryElectronic MaterialsSurface ScienceElectrode MaterialsEtching ProcessesPlasma FundamentalsPlasma Surface TreatmentPlasma-surface InteractionsEtch ChemistryEtch MechanismsPlasma Etching
8
Plasma Etching of RuO<sub>2</sub> Thin Films
Shinji Saito Kuramasu · Japanese Journal of Applied Physics · 1992 · 85 citations
Natural Sciences, Materials Engineering, Materials Science +17
High-Temperature Etching of PZT/Pt/TiN Structure by High-Density ECR Plasma
Seiichi Yokoyama, Yasuyuki Ito, Kazuya Ishihara et al. · Japanese Journal of Applied Physics · 1995 · 83 citations
Control of Etch Slope during Etching of Pt in Ar/Cl<sub>2</sub>/O<sub>2</sub> Plasmas
Won Jong Yoo, Jin Hwan Hahm, Hyoun Woo Kim et al. · Japanese Journal of Applied Physics · 1996 · 66 citations
Engineering, Electrical Engineering, Microfabrication +16
Reactive ion etching of RuO2 thin films using the gas mixture O2/CF3CFH2
Seshu B. Desu · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 48 citations
Natural Sciences, Materials Engineering, Materials Science +15
Ultrathin Ta2 O 5 Film Capacitor with Ru Bottom Electrode
Tomonori Aoyama, Soichi Yamazaki, Keitaro Imai · Journal of The Electrochemical Society · 1998 · 38 citations