Han-Ku Cho

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Ji-Young Lee, Jangho Shin, Hyunwoo Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 43 citations

Engineering, Electrical Engineering, Materials Science +17

Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask

Seungho Lee, Bong-Kyun Kang, Min-Su Kim et al. · Japanese Journal of Applied Physics · 2012 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +15

Etching characteristics and modeling for oval-shaped contact

Sungchan Park, Seok-Hyun Lim, Chulho Shin et al. · Thin Solid Films · 2006 · 20 citations

Engineering, Electrical Engineering, Materials Science +10

Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor

K. Tokashiki, Keun-Hee Bai, Kyehyun Baek et al. · Thin Solid Films · 2006 · 15 citations

Engineering, Computer Engineering, Electrical Engineering +12

Mask writing time explosion and its effect on CD control in e-beam lithography

Sang Hee Lee, Jin Choi, Seong Jun Min et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 13 citations

Engineering, Electrical Engineering, Electronic Materials +10