Journal of Applied Physics · 2007 · 24 citations · 17 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsDopingEpitaxial GrowthPhotodetectorsSemiconductor DetectorsSemiconductor Device MaterialsSemiconductor PhysicsMolecular Beam EpitaxyOptical GainOptical Gain In SemiconductorsOptical Gain MaterialsP-type DopingPhotodiodesReverse Bias Characteristics
We report bulk GaInNAs p−i−n photodiodes lattice-matched to GaAs substrates, grown by solid source molecular beam epitaxy with photoresponses out to ∼1.3 μm. The as-grown samples were characterized optically, structurally, and electrically. A low background doping concentration in the range of 1014–1015 cm−3 was obtained in the samples. One of the samples with a 0.5 μm thick GaInNAs absorbing layer gave a responsivity of 0.11 A/W for a band edge of 1.28 μm at reverse bias of 2 V.
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Plastic relaxation of InGaAs grown on GaAs
D. J. Dunstan, P. Kidd, L. K. Howard et al. · Applied Physics Letters · 1991 · 100 citations