Concepedia

Selective etching of Si1−xGex versus Si with gaseous HCl for the formation of advanced CMOS devices

N. Loubet, T. Kormann, G. Chabanne, S. Denorme, D. Dutartre

Thin Solid Films · 2008 · 29 citations · 3 references

DOI

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3

Silicon-on-Nothing (SON)-an innovative process for advanced CMOS

M. Jurczak, T. Skotnicki, M. Paoli et al. · IEEE Transactions on Electron Devices · 2000 · 217 citations

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Chemical vapour etching of Si, SiGe and Ge with HCl; applications to the formation of thin relaxed SiGe buffers and to the revelation of threading dislocations

Y. Bogumilowicz, Jean‐Michel Hartmann, R. Truche et al. · Semiconductor Science and Technology · 2004 · 86 citations

, , +17

Isotropic Etching of Si<sub>1-x</sub>Ge<sub>x</sub> Buried Layers Selectively to Si for the Realization of Advanced Devices

S. Borel, V. Caubet, Jeremy Bilde et al. · ECS Transactions · 2006 · 17 citations

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