R. Truche

Chemical vapour etching of Si, SiGe and Ge with HCl; applications to the formation of thin relaxed SiGe buffers and to the revelation of threading dislocations

Y. Bogumilowicz, Jean‐Michel Hartmann, R. Truche et al. · Semiconductor Science and Technology · 2004 · 85 citations

Engineering, Situ Hcl, Sige Buffers +16

Medium resolution off-axis electron holography with millivolt sensitivity

David Cooper, R. Truche, P. Rivallin et al. · Applied Physics Letters · 2007 · 79 citations

Holography, Engineering, Microscopy +17

From substrate to VLSI: investigation of hardened SIMOX without epitaxy, for dose, dose rate and SEU phenomena

J.L. Leray, E. Dupont-Nivet, O. Musseau et al. · IEEE Transactions on Nuclear Science · 1988 · 71 citations

Engineering, Vlsi Design, Dose Rate +17

75 nm damascene metal gate and high-k integration for advanced CMOS devices

B. Guillaumot, X. Garros, F. Lime et al. · 2003 · 69 citations

Low-power Electronics, Electrical Engineering, Low Ioff +14

Reduced pressure chemical vapour deposition of SiGe virtual substrates for high mobility devices

Jean‐Michel Hartmann, Y. Bogumilowicz, P. Holliger et al. · Semiconductor Science and Technology · 2003 · 48 citations

Engineering, Vacuum Device, Silicon On Insulator +22