P. Holliger

Reduced pressure–chemical vapor deposition of Ge thick layers on Si(001) for 1.3–1.55-μm photodetection

Jean‐Michel Hartmann, Alexandra Abbadie, Anne‐Marie Papon et al. · Journal of Applied Physics · 2004 · 220 citations

Optical Materials, Engineering, Ge-based Photodetectors +19

Reduced pressure-chemical vapor deposition of intrinsic and doped Ge layers on Si(001) for microelectronics and optoelectronics purposes

Jean‐Michel Hartmann, J.F. Damlencourt, Y. Bogumilowicz et al. · Journal of Crystal Growth · 2004 · 133 citations

Materials Science, Ge Layers, Electrical Engineering +11

Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O

L.G. Gosset, J.-F. Damlencourt, O. Renault et al. · Journal of Non-Crystalline Solids · 2002 · 125 citations

Materials Science, Aluminium Nitride, Material Analysis +7

Stable lead isotopes ratios in major french rivers and estuaries

P. Holliger, D. Petit · The Science of The Total Environment · 1986 · 99 citations

Major French Rivers, Biogeochemistry, Estuarine Geochemistry +8

SiGe growth kinetics and doping in reduced pressure-chemical vapor deposition

Jean‐Michel Hartmann, V. Loup, G. Rolland et al. · Journal of Crystal Growth · 2002 · 93 citations

Materials Engineering, Materials Science, Engineering +8