O. Renault

HfO 2 / SiO 2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy

O. Renault, D. Samour, J.-F. Damlencourt et al. · Applied Physics Letters · 2002 · 200 citations

Materials Science, Ii-vi Semiconductor, Sio2 Contributions +14

Covalent Design for Dye-Sensitized H₂-Evolving Photocathodes Based on a Cobalt Diimine–Dioxime Catalyst

Nicolas Kaeffer, Julien Massin, Colette Lebrun et al. · Journal of the American Chemical Society · 2016 · 151 citations · Full text

Engineering, Inorganic Photochemistry, Synthetic Photochemistry +18

High-Efficiency Organic Electroluminescent Devices Using an Organoterbium Emitter

Simone Capecchi, O. Renault, D. G. Moon et al. · Advanced Materials · 2000 · 148 citations

Optical Materials, Engineering, Organic Electronics +23

High resolution x-ray photoemission study of plasma oxidation of indium–tin–oxide thin film surfaces

Victor Christou, M. Etchells, O. Renault et al. · Journal of Applied Physics · 2000 · 142 citations

Materials Science, Chemical Engineering, Electronic Devices +12

Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O

L.G. Gosset, J.-F. Damlencourt, O. Renault et al. · Journal of Non-Crystalline Solids · 2002 · 125 citations

Materials Science, Aluminium Nitride, Material Analysis +7