Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O - Concepedia

Concepedia

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Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O

125

Citations

14

References

2002

Year

L.G. Gosset, J.-F. Damlencourt, O. Renault, D. Rouchon, P. Holliger, A. Ermolieff, I. Trimaille, J.‐J. Ganem, F. Martín, M.N. Séméria

Journal of Non-Crystalline Solids

Materials ScienceAluminium NitrideMaterial AnalysisEngineeringMaterial CharacterizationSurface ScienceApplied PhysicsThin Al2o3 LayersChemical DepositionChemical Vapor Deposition

References

	Year	Citations

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