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Reduced pressure-chemical vapor deposition of intrinsic and doped Ge layers on Si(001) for microelectronics and optoelectronics purposes

Materials ScienceGe LayersElectrical EngineeringEngineeringSurface ScienceApplied PhysicsPressure-chemical Vapor DepositionSemiconductor Device FabricationVacuum DeviceChemical DepositionOptoelectronics PurposesMicroelectronicsChemical Vapor DepositionSilicon On Insulator