Selective Etching

Selective Etching is an etching process that distinguishes itself by preferentially removing one material over another in a multilayer or multiphase system, based on differences in chemical or physical susceptibility to the etchant.

1.6K

Publications

102.1K

Citations

6.8K

Authors

1.2K

Institutions

Publications per year

2017–2026

373

Authors

6.8K

  1. YG
    Yury Gogotsi

    Drexel University, United States

    16 publications · 18.8K citations

    16

    h-index

  2. OG
    Oliver G. Schmidt

    Leibniz Institute for Solid State and Materials Research, Germany

    16 publications · 802 citations

    14

    h-index

  3. GS
    G. S. Oehrlein

    University of Maryland, College Park, United States

    14 publications · 1.3K citations

    14

    h-index

  4. SJ
    S. J. Pearton

    University of Florida, United States

    15 publications · 647 citations

    14

    h-index

  5. JW
    J.L. Weyher

    Institute of High Pressure Physics, Poland

    15 publications · 725 citations

    13

    h-index

1–5 of 6.8K

Venues

  1. Applied Physics Letters

    141 publications · 8.8K citations

    46

    h-index

  2. Journal of Applied Physics

    68 publications · 3.4K citations

    34

    h-index

  3. Journal of The Electrochemical Society

    JES · 102 publications · 3.7K citations

    34

    h-index

  4. 28

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 81 publications · 2.2K citations

    26

    h-index

1–5