Publication | Closed Access

Surface cleaning and preparation in AlGaN/GaN-based HEMT processing as assessed by X-ray photoelectron spectroscopy

Materials ScienceWide-bandgap SemiconductorAlgan/gan-based Hemt ProcessingAluminium NitrideEngineeringCorrosionSurface ScienceApplied PhysicsX-ray Photoelectron SpectroscopySurface CleaningAluminum Gallium NitrideGan Power DeviceCategoryiii-v Semiconductor