Concepedia

Influence of plasma treatment on low-k dielectric films in semiconductor manufacturing

Ping Yang, D. Lu, R. Kumar, H. O. Moser

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2005 · 16 citations · 6 references

DOI

Concepts

References

6

Low dielectric constant materials for microelectronics

Karen Maex, Mikhaı̈l R. Baklanov, Denis Shamiryan et al. · Journal of Applied Physics · 2003 · 1.6K citations

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Comparative study of SiOCH low-<i>k</i> films with varied porosity interacting with etching and cleaning plasma

Denis Shamiryan, Mikhaı̈l R. Baklanov, S. Vanhaelemeersch et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 150 citations

, , +17

Low-k materials etching in magnetic neutral loop discharge plasma

Yasuhiro Morikawa, Shoichiro Yasunami, W. Chen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 44 citations

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Low Dielectric Constant Materials for IC Intermetal Dielectric Applications: A Status Report on the Leading Candidates

Neil H. Hendricks · MRS Proceedings · 1996 · 39 citations

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Investigation of structure, thermal and oxygen plasma stability of mesoporous methylsilsesquioxane films by X-ray reflectivity and small angle scattering

T.K. Goh, T.K.S. Wong · Microelectronic Engineering · 2004 · 14 citations

, , +17