Plasma Deposition
Plasma Deposition is a thin-film fabrication technique within plasma surface treatment that involves the formation of solid material on a substrate through the chemical reaction or physical condensation of plasma-generated species, distinguishing it from competing surface modification processes by its additive, layer-by-layer growth mechanism.
3.2K
Publications
116.5K
Citations
10K
Authors
1.9K
Institutions
Publications per year
2017–2026
429
3.2K
P. Fauchais · Journal of Physics D Applied Physics · 2004 · 750 citations
Thin-film deposition: principles and practice
Choice Reviews Online · 1996 · 714 citations
Natural Sciences, Materials Engineering, Materials Science +17
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Eindhoven University of Technology, Netherlands
34 publications · 1.3K citations
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1.9K

Centre National de la Recherche Scientifique
Paris, France
35 h-index
439 publications
19.1K citations
Eindhoven University of Technology
Eindhoven, The Netherlands
29 h-index
210 publications
9.7K citations
University of Bari Aldo Moro
Bari, Italy
27 h-index
175 publications
6.7K citations
IBM (United States)
Armonk, United States
22 h-index
56 publications
3.4K citations

Chinese Academy of Sciences
Beijing, China
22 h-index
160 publications
5.2K citations

Lawrence Berkeley National Laboratory
Berkeley, United States
22 h-index
91 publications
6.2K citations
Forschungszentrum Jülich
Jülich, Germany
20 h-index
114 publications
4.6K citations
Nanyang Technological University
Singapore, Singapore
20 h-index
108 publications
3.9K citations
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342 publications · 11.4K citations
52
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255 publications · 9.1K citations
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146 publications · 6.1K citations
43
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121 publications · 5.7K citations
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96 publications · 5K citations
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