Plasma Deposition

Plasma Deposition is a thin-film fabrication technique within plasma surface treatment that involves the formation of solid material on a substrate through the chemical reaction or physical condensation of plasma-generated species, distinguishing it from competing surface modification processes by its additive, layer-by-layer growth mechanism.

3.2K

Publications

116.5K

Citations

10K

Authors

1.9K

Institutions

Publications per year

2017–2026

429

Authors

10K

  1. MC
    M. C. M. van de Sanden

    Eindhoven University of Technology, Netherlands

    34 publications · 1.3K citations

    23

    h-index

  2. PF
    Pietro Favia

    University of Bari Aldo Moro, Italy

    25 publications · 1.2K citations

    21

    h-index

  3. RD
    Riccardo d’Agostino

    University of Bari Aldo Moro, Italy

    22 publications · 1.2K citations

    18

    h-index

  4. RD
    Robert D. Short

    University of South Australia, Australia

    19 publications · 1K citations

    18

    h-index

  5. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    23 publications · 1.4K citations

    18

    h-index

1–5 of 10K

Venues

  1. Surface and Coatings Technology

    342 publications · 11.4K citations

    52

    h-index

  2. Thin Solid Films

    255 publications · 9.1K citations

    46

    h-index

  3. 43

    h-index

  4. Journal of Applied Physics

    121 publications · 5.7K citations

    39

    h-index

  5. Applied Physics Letters

    96 publications · 5K citations

    38

    h-index

1–5