M. C. M. van de Sanden

The 2017 Plasma Roadmap: Low temperature plasma science and technology

Igor Adamovich, Scott Baalrud, Annemie Bogaerts et al. · Journal of Physics D Applied Physics · 2017 · 939 citations · Full text

Natural Sciences, Physics, Condensed Matter Physics +7

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 881 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Bram Hoex, S. B. S. Heil, E. Langereis et al. · Applied Physics Letters · 2006 · 720 citations · Full text

Engineering, Materials Engineering, Materials Science +17

X-Ray photoelectron spectroscopy reference data for identification of the C3N4 phase in carbon–nitrogen films

A.P. Dementjev, Anneke de Graaf, M. C. M. van de Sanden et al. · Diamond and Related Materials · 2000 · 561 citations

Natural Sciences, Chemistry, Materials Science +12

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

Bram Hoex, J. J. H. Gielis, M. C. M. van de Sanden et al. · Journal of Applied Physics · 2008 · 538 citations · Full text

Engineering, Materials Engineering, Materials Science +17