Harald B. Profijt

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 864 citations · Full text

Materials Science, Materials Engineering, Chemical Engineering +13

Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al[sub 2]O[sub 3]

G. Dingemans, N. M. Terlinden, Dieter Pierreux et al. · Electrochemical and Solid-State Letters · 2010 · 162 citations · Full text

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

Harald B. Profijt, M. C. M. van de Sanden, W. M. M. Kessels · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 104 citations · Full text

Materials Science, Electrical Engineering, Plasma Electronics +12

Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides

Harald B. Profijt, P. Kudláček, M. C. M. van de Sanden et al. · Journal of The Electrochemical Society · 2011 · 82 citations · Full text

Room‐Temperature ALD of Metal Oxide Thin Films by Energy‐Enhanced ALD

Stephen E. Potts, Harald B. Profijt, Robin Roelofs et al. · Chemical Vapor Deposition · 2013 · 69 citations · Full text

Engineering, Solid-state Chemistry, Tio 2 +16