Stephen E. Potts - Concepedia

Author

Stephen E. Potts

Eindhoven University of Technology ORCID

Also Known As

Kessels, W.M.M., Potts, S.E., S. E. Potts, S.E. Potts, Stephen E. Potts, Stephen Ernest Potts, Stephen Potts

Publications

2.1K

Citations

H-Index

Concepts

All Affiliations

Eindhoven University of Technology University College London Holst Centre (Netherlands)Plasma (Macedonia)Centre National de la Recherche Scientifique

About

Stephen E. Potts is an author at Eindhoven University of Technology specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	15	1.7K
2	Applied Physics	8	8	1.4K
3	Chemistry	8	8	412
4	Chemical Engineering	7	7	1.2K
5	Biostatistics	1	1	42

Stephen E. Potts

Publications

Citations

H-Index

Page 1

	Year	Citations
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceMaterials EngineeringChemical EngineeringPlasma ElectronicsPlasma Species	2011	864
Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films Stephen E. Potts, W. Keuning, E. Langereis, Journal of The Electrochemical Society	2010	172
Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection Stephen E. Potts, Lilia Schmalz, M. Fenker, Journal of The Electrochemical Society	2011	110
Atomic Layer Deposition of Silicon Nitride from Bis(<i>tert</i>-butylamino)silane and N<sub>2</sub> Plasma Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, ACS Applied Materials & Interfaces Materials ScienceSemiconductorsElectrical EngineeringEngineeringNanoelectronics	2015	103
Energy-enhanced atomic layer deposition for more process and precursor versatility Stephen E. Potts, W. M. M. Kessels Coordination Chemistry Reviews Materials ScienceChemical EngineeringPrecursor VersatilityEngineeringNanotechnology	2013	102
Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor Yizhi Wu, Stephen E. Potts, P. M. Hermkens, Chemistry of Materials Aluminium NitrideEngineeringThin Film Process TechnologyChemical DepositionSemiconductors	2013	90
Electrical transport and Al doping efficiency in nanoscale ZnO films prepared by atomic layer deposition Yongjun Wu, P. M. Hermkens, Bas W. H. van de Loo, Journal of Applied Physics Aluminium NitrideEngineeringAl ContentChemistryElectrical Transport	2013	79
Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-O<i>i</i>Pr)]2, as an alternative aluminum precursor Stephen E. Potts, G. Dingemans, Christophe Lachaud, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceAluminium NitrideChemical EngineeringDimethylaluminum IsopropoxideHigh Temperature Materials	2012	76
Room‐Temperature ALD of Metal Oxide Thin Films by Energy‐Enhanced ALD Stephen E. Potts, Harald B. Profijt, Robin Roelofs, Chemical Vapor Deposition EngineeringSolid-state ChemistryTio 2Thin Film Process TechnologyChemistry	2013	69
Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO Diana Garcia‐Alonso, Stephen E. Potts, Cristian A. A. van Helvoirt, Journal of Materials Chemistry C Materials ScienceMaterials EngineeringElectrical EngineeringDoping EfficiencyEngineering	2015	63

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