Harm C. M. Knoops

<i>In situ</i>spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

E. Langereis, S. B. S. Heil, Harm C. M. Knoops et al. · Journal of Physics D Applied Physics · 2009 · 289 citations

Natural Sciences, Materials Engineering, Materials Science +17

Status and prospects of plasma-assisted atomic layer deposition

Harm C. M. Knoops, Tahsin Faraz, Karsten Arts et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 216 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +16

Conformality of Plasma-Assisted ALD: Physical Processes and Modeling

Harm C. M. Knoops, E. Langereis, M. C. M. van de Sanden et al. · Journal of The Electrochemical Society · 2010 · 192 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?

Tahsin Faraz, F. Roozeboom, Harm C. M. Knoops et al. · ECS Journal of Solid State Science and Technology · 2015 · 149 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy

W. M. M. Kessels, Harm C. M. Knoops, S. A. F. Dielissen et al. · Applied Physics Letters · 2009 · 131 citations · Full text

Natural Sciences, Chemistry, Materials Science +17