S. B. S. Heil

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Bram Hoex, S. B. S. Heil, E. Langereis et al. · Applied Physics Letters · 2006 · 720 citations · Full text

Engineering, Materials Engineering, Materials Science +17

<i>In situ</i>spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

E. Langereis, S. B. S. Heil, Harm C. M. Knoops et al. · Journal of Physics D Applied Physics · 2009 · 289 citations

Natural Sciences, Materials Engineering, Materials Science +17

Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

J. Leo van Hemmen, S. B. S. Heil, J.H. Klootwijk et al. · Journal of The Electrochemical Society · 2007 · 273 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

E. Langereis, Mariadriana Creatore, S. B. S. Heil et al. · Applied Physics Letters · 2006 · 267 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor

S. B. S. Heil, J. Leo van Hemmen, C. J. Hodson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2007 · 126 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15