Concepedia

C. J. Hodson

CJ

Statistics

Publications

2

Citations

399

H-Index

2

Active since

2007

Affiliations

Oxford Instruments (United Kingdom)(Current)

NXP (Netherlands)

Philips (Netherlands)

Eindhoven University of Technology

C. J. Hodson is an author at Oxford Instruments (United Kingdom) specializing in atomic layer deposition, natural sciences, and materials engineering.

Publications per year

2007–2007

2

Publications

2

Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

J. Leo van Hemmen, S. B. S. Heil, J.H. Klootwijk et al. · Journal of The Electrochemical Society · 2007 · 273 citations · Full text

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Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor

S. B. S. Heil, J. Leo van Hemmen, C. J. Hodson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2007 · 126 citations · Full text

, , +15

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