J.H. Klootwijk

Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

J. Leo van Hemmen, S. B. S. Heil, J.H. Klootwijk et al. · Journal of The Electrochemical Society · 2007 · 273 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon

J.H. Klootwijk, K. B. Jinesh, Wouter Dekkers et al. · IEEE Electron Device Letters · 2008 · 153 citations

Engineering, Materials Engineering, Materials Science +13

Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor

S. B. S. Heil, J. Leo van Hemmen, C. J. Hodson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2007 · 126 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +15

Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

Harm C. M. Knoops, Loïc Baggetto, E. Langereis et al. · Journal of The Electrochemical Society · 2008 · 103 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

On the electrochemistry of an anode stack for all-solid-state 3D-integrated batteries

Loïc Baggetto, Jos Oudenhoven, T. van Dongen et al. · Journal of Power Sources · 2008 · 102 citations

Natural Sciences, Chemical Engineering, Materials Science +14