Bram Hoex

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Bram Hoex, S. B. S. Heil, E. Langereis et al. · Applied Physics Letters · 2006 · 712 citations · Full text

Engineering, Thin Film Process Technology, Thin Al2o3 Film +22

On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3

Bram Hoex, J. J. H. Gielis, M. C. M. van de Sanden et al. · Journal of Applied Physics · 2008 · 528 citations · Full text

Engineering, Optoelectronic Devices, Silicon On Insulator +16

Black silicon: fabrication methods, properties and solar energy applications

Xiaogang Liu, Paul R. Coxon, Ian Marius Peters et al. · Energy & Environmental Science · 2014 · 491 citations · Full text

Materials Science, Electrical Engineering, Engineering +10

Silicon surface passivation by atomic layer deposited Al2O3

Bram Hoex, Jan Schmidt, Peter Pohl et al. · Journal of Applied Physics · 2008 · 466 citations · Full text

Materials Science, Semiconductors, Thin Al2o3 Films +14

Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al₂O₃

Jan Schmidt, Agnes Merkle, Rolf Brendel et al. · Progress in Photovoltaics Research and Applications · 2008 · 447 citations

Nm Al 2, Engineering, Photovoltaics +16