Shoichiro Yasunami

Low-k materials etching in magnetic neutral loop discharge plasma

Yasuhiro Morikawa, Shoichiro Yasunami, W. Chen et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 44 citations

Materials Science, Low-k Materials, Electrical Engineering +13

Application of magnetic neutral loop discharge plasma in deep silica etching

W. Chen, K. Sugita, Yasuhiro Morikawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 32 citations

Engineering, Plasma Physics, Optical Mems +17

Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist

Masayuki Naya, Isao Tsuruma, T. Tani et al. · Applied Physics Letters · 2005 · 28 citations

Photonics, Resist Film Thickness, Bilayer Resist +13

SUBSTRATE ENTRAPMENT AND FORMATION OF pH GRADIENT IN AMMONIUM BILAYER VESICLES

Toyoki Kunitake, Yoshio Okahata, Shoichiro Yasunami · Chemistry Letters · 1981 · 15 citations

Proteinlipid Interaction, Membrane Formation, Biochemistry +12

The material design to reduce outgassing in acetal-based chemically amplified resist for EUV lithography

Seiya Masuda, Yasutomo Kawanishi, Shuuji Hirano et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 15 citations

Engineering, Electron-beam Lithography, Euv Lithography +21