Concepedia

Publication | Open Access

Predicting mask distortion, clogging and pattern transfer for stencil lithography

DOIFull Paper Access

48

Citations

23

References

2006

Year

Maryna Lishchynska, Victor Bourenkov, M A F van den Boogaart, L M Doeswijk, Juergen Brügger, James C. Greer
Microelectronic Engineering

References

YearCitations

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