David W. Hoffman - Concepedia

Author

David W. Hoffman

Also Known As

D Hoffman, D W Hoffman, D. HOFFMAN, D. Hoffman, D. W. HOFFMAN, D. W. Hoffman, D.W Hoffman, D.W. Hoffman, DAVID W. HOFFMAN, Daniel-At-Github

150

Publications

6.7K

Citations

H-Index

126

Concepts

All Affiliations

The University of Texas at Austin Ford Motor Company (United States)Duke University Hospital Duke Medical Center Duke University

About

David W. Hoffman is an author at The University of Texas at Austin specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	24	35	4.3K
2	Applied Physics	18	24	3.3K
3	Medicine	16	24	718
4	Natural Sciences	15	18	950
5	Biochemistry	12	12	334

David W. Hoffman

Publications

6.4K

Citations

H-Index

Page 1

	Year	Citations
Stress-related effects in thin films John A. Thornton, David W. Hoffman Thin Solid Films Materials ScienceEngineeringApplied PhysicsStressstrain AnalysisMagnetic Thin Films	1989	1.1K
A vector thermodynamics for anisotropic surfaces David W. Hoffman, John W. Cahn Surface Science EngineeringGeometric Partial Differential EquationEntropySurface EnergyNumerical Simulation	1972	406
Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering John A. Thornton, David W. Hoffman Journal of Vacuum Science and Technology Thin Film PhysicsEngineeringTantalum FilmsSputtering‐pressure DependenceThin Film Process Technology	1977	297
Diphasic Xerogels, A New Class of Materials: Phases in the System Al <sub>2</sub> o <sub>3</sub> ‐Sio <sub>2</sub> David W. Hoffman, Rustum Roy, Sridhar Komarneni Journal of the American Ceramic Society	1984	276
Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source David W. Hoffman, John A. Thornton Journal of Vacuum Science and Technology EngineeringPlanar Magnetron SourceThin Film Process TechnologySemiconductorsMagnetism	1982	255
Internal stresses in metallic films deposited by cylindrical magnetron sputtering John A. Thornton, J. Tabock, David W. Hoffman Thin Solid Films Materials ScienceMagnetismMaterials EngineeringEngineeringCylindrical Magnetron Sputtering	1979	248
Internal stresses in sputtered chromium David W. Hoffman, John A. Thornton Thin Solid Films Materials ScienceEngineeringStressstrain AnalysisResidual StressHigh Strain Rate	1977	214
The compressive stress transition in Al, V, Zr, Nb and W metal films sputtered at low working pressures David W. Hoffman, John A. Thornton Thin Solid Films Materials ScienceMaterials EngineeringEngineeringCompressive Stress TransitionSevere Plastic Deformation	1977	201
A vector thermodynamics for anisotropic surfaces II. Curved and faceted surfaces John W. Cahn, David W. Hoffman Scripta Metallurgica Geometric ModelingEngineeringGeometryPhysicsNatural Sciences	1974	159
Modification of evaporated chromium by concurrent ion bombardment David W. Hoffman, M. R. Gaerttner Journal of Vacuum Science and Technology Materials ScienceMaterials EngineeringChemical EngineeringIon ImplantationEngineering	1980	156

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