John A. Thornton - Concepedia

Author

John A. Thornton

University of Illinois Urbana-Champaign ORCID

Also Known As

Daniel Thedens, J A THORNTON, J A Thornton, J Thornton, J. A. THORNTON, J. A. Thornton, J. THORNTON, J. Thornton, J.A. THORNTON, J.A. Thornton

222

Publications

12.5K

Citations

H-Index

164

Concepts

All Affiliations

University of Illinois Urbana-Champaign Defence Science and Technology Group Ford Motor Company (United States)RAND Corporation University of Sheffield

About

John A. Thornton is an author at University of Illinois Urbana-Champaign specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	35	58	11.2K
2	Medicine	12	13	539
3	Health Sciences	3	3	94
4	Natural Sciences	3	3	389
5	Social Sciences	1	1	18

John A. Thornton

Publications

12K

Citations

H-Index

Page 1

	Year	Citations
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings John A. Thornton Journal of Vacuum Science and Technology EngineeringApparatus GeometryDeposition ConditionsChemical DepositionArgon Pressure	1974	2.3K
High Rate Thick Film Growth John A. Thornton Annual Review of Materials Science Materials ScienceMetallic MaterialsAdditive Manufacturing TechniquesMetal ProcessingEngineering	1977	2.1K
The microstructure of sputter‐deposited coatings John A. Thornton Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringThin Film Process TechnologySputter‐deposited CoatingsSurface TechnologyEpitaxial Growth	1986	1.3K
Stress-related effects in thin films John A. Thornton, David W. Hoffman Thin Solid Films Materials ScienceEngineeringApplied PhysicsStressstrain AnalysisMagnetic Thin Films	1989	1.1K
Influence of substrate temperature and deposition rate on structure of thick sputtered Cu coatings John A. Thornton Journal of Vacuum Science and Technology EngineeringCu CoatingsChemical DepositionStructural MaterialsElectron Microscopy	1975	432
Magnetron sputtering: basic physics and application to cylindrical magnetrons John A. Thornton Journal of Vacuum Science and Technology MagnetismElectrical EngineeringMagnetron ModeEngineeringPlasma Electronics	1978	359
Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering John A. Thornton, David W. Hoffman Journal of Vacuum Science and Technology Thin Film PhysicsEngineeringTantalum FilmsSputtering‐pressure DependenceThin Film Process Technology	1977	297
Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron source David W. Hoffman, John A. Thornton Journal of Vacuum Science and Technology EngineeringPlanar Magnetron SourceThin Film Process TechnologySemiconductorsMagnetism	1982	255
Internal stresses in metallic films deposited by cylindrical magnetron sputtering John A. Thornton, J. Tabock, David W. Hoffman Thin Solid Films Materials ScienceMagnetismMaterials EngineeringEngineeringCylindrical Magnetron Sputtering	1979	248
Internal stresses in sputtered chromium David W. Hoffman, John A. Thornton Thin Solid Films Materials ScienceEngineeringStressstrain AnalysisResidual StressHigh Strain Rate	1977	214

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