Pattern Distortion Correction

Pattern Distortion Correction is a methodological framework in mask design that systematically identifies and compensates for geometric deformations in patterning processes to ensure fidelity between the intended and fabricated mask patterns.

128

Publications

4.2K

Citations

515

Authors

144

Institutions

Publications per year

2017–2026

26

Authors

515

  1. AZ
    Avideh Zakhor

    University of California, Berkeley, United States

    5 publications · 240 citations

    5

    h-index

  2. SO
    Shigehisa Ohki

    NTT Basic Research Laboratories, Japan

    4 publications · 65 citations

    4

    h-index

  3. NB
    Nicolas B. Cobb

    Mentor Technologies, United States

    3 publications · 106 citations

    3

    h-index

  4. EY
    Edmund Y. Lam

    University of Hong Kong, Hong Kong SAR China

    3 publications · 73 citations

    3

    h-index

  5. EG
    Edward G. Lovell

    University of Wisconsin–Madison, United States

    3 publications · 41 citations

    3

    h-index

1–5 of 515

Venues

  1. 16

    h-index

  2. Japanese Journal of Applied Physics

    JJAP · 7 publications · 125 citations

    7

    h-index

  3. Optics Express

    6 publications · 191 citations

    6

    h-index

  4. IEEE Transactions on Antennas and Propagation

    6 publications · 342 citations

    6

    h-index

  5. 5

    h-index

1–5