Pattern Distortion Correction
Pattern Distortion Correction is a methodological framework in mask design that systematically identifies and compensates for geometric deformations in patterning processes to ensure fidelity between the intended and fabricated mask patterns.
128
Publications
4.2K
Citations
515
Authors
144
Institutions
Publications per year
2017–2026
26
Parents
128
Probe compensation in thick microstrip patches
P.S. Hall · Electronics Letters · 1987 · 211 citations
Suppression of Cross-Band Scattering in Multiband Antenna Arrays
Hai-Han Sun, Can Ding, He Zhu et al. · IEEE Transactions on Antennas and Propagation · 2019 · 179 citations · Full text
1–5 of 128
515
5
h-index
4
h-index
3
h-index
3
h-index
3
h-index
1–5 of 515
144
University of California, Berkeley
Berkeley, United States
8 h-index
14 publications
538 citations
IBM (United States)
Armonk, United States
7 h-index
20 publications
525 citations
ASML (Netherlands)
Veldhoven, The Netherlands
5 h-index
22 publications
607 citations
University of Wisconsin–Madison
Madison, United States
4 h-index
13 publications
183 citations
NTT Basic Research Laboratories
Atsugi, Japan
4 h-index
11 publications
706 citations
Georgia Institute of Technology
Atlanta, United States
4 h-index
11 publications
209 citations
Mentor Technologies
Tulsa, United States
3 h-index
10 publications
158 citations
The University of Osaka
Osaka, Japan
3 h-index
4 publications
86 citations
1–8 of 144
25 publications · 635 citations
16
h-index
JJAP · 7 publications · 125 citations
7
h-index
6 publications · 191 citations
6
h-index
6 publications · 342 citations
6
h-index
5 publications · 127 citations
5
h-index
1–5