Shigehisa Ohki

Ta Film Properties for X-Ray Mask Absorbers

M. Oda, Akira Ozawa, Shigehisa Ohki et al. · Japanese Journal of Applied Physics · 1990 · 28 citations

Materials Science, Engineering, Health Sciences +12

Cavernous undercuts appearing in reactive ion etched submicron-wide deep trenches

Shigehisa Ohki, M. Oda, Hideo Akiya et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 24 citations

Ion Implantation, Engineering, Physics +9

Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs

Shigehisa Ohki, Masami Kakuchi, Tadahito Matsuda et al. · Japanese Journal of Applied Physics · 1989 · 22 citations

Engineering, Electron-beam Lithography, Microscopy +17

An X-ray mask using SiC membrane deposited by ECR plasma CVD

M. Oda, Takashi Ohkubo, Akira Ozawa et al. · Microelectronic Engineering · 1990 · 22 citations

Materials Science, Electrical Engineering, X-ray Spectroscopy +9

X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes

Shigehisa Ohki, T. Yoshihara · Japanese Journal of Applied Physics · 1993 · 19 citations

Image Reconstruction, Engineering, Electron-beam Lithography +22