Mask Pattern Fidelity is a metric that quantifies the degree to which the geometric and spatial characteristics of a fabricated photomask accurately reproduce the intended design pattern, serving as a critical indicator of pattern transfer precision in semiconductor lithography.
38
Publications
1K
Citations
134
Authors
35
Institutions
Publications per year
2017–2026
6
Parents
Publications
38
1–5 of 38
Authors
134
- XM
6
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- LP
5
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- EY
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- CH
3
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- MS
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1–5 of 134
Institutions
35
Luminex (United States)
Austin, United States
5 h-index
16 publications
544 citations
University of Hong Kong
Pok Fu Lam, Hong Kong
4 h-index
10 publications
352 citations
Beijing Institute of Technology
Beijing, China
3 h-index
11 publications
207 citations
Semiconductor Manufacturing International (China)
Shanghai, China
3 h-index
9 publications
144 citations
Georgia Institute of Technology
Atlanta, United States
3 h-index
8 publications
167 citations
Association of Super-Advanced Electronics
Tokyo, Japan
3 h-index
7 publications
162 citations
Huazhong University of Science and Technology
Wuhan, China
3 h-index
2 publications
83 citations
The University of Osaka
Osaka, Japan
2 h-index
2 publications
30 citations
1–8 of 35
Venues
- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
11 publications · 337 citations
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- Optics Express
8 publications · 282 citations
9
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- Applied Optics
3 publications · 66 citations
3
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- Journal of Micro/Nanolithography MEMS and MOEMS
2 publications · 26 citations
2
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- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
2 publications · 50 citations
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