Mask Pattern Transfer is a methodological process in photolithography by which a geometric pattern defined on a photomask is precisely replicated onto a photosensitive material layer on a substrate through selective exposure to light, thereby enabling the fabrication of micro- and nanoscale features in semiconductor devices.
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Pattern transfer to silicon by microcontact printing and RIE
Thomas K. Whidden, D. K. Ferry, Michael N. Kozicki et al. · Nanotechnology · 1996 · 92 citations
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95
University of Wisconsin–Madison
Madison, United States
4 h-index
15 publications
207 citations
Tohoku University
Sendai, Japan
3 h-index
11 publications
242 citations
IBM (United States)
Armonk, United States
3 h-index
6 publications
389 citations
United States Naval Research Laboratory
Washington, United States
3 h-index
13 publications
977 citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
3 h-index
10 publications
594 citations
California Institute of Technology
Pasadena, United States
2 h-index
12 publications
345 citations
AT&T (United States)
Bedminster, United States
2 h-index
7 publications
182 citations
University of Houston
Houston, United States
2 h-index
7 publications
121 citations
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- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
7 publications · 101 citations
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- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
7 publications · 243 citations
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- Applied Physics Letters
6 publications · 541 citations
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- Microelectronic Engineering
6 publications · 195 citations
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- Japanese Journal of Applied Physics
JJAP · 5 publications · 103 citations
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