Pattern Transfer Resolution

Pattern Transfer Resolution is a metric that quantifies the fidelity with which a designed pattern is accurately replicated from a resist or mask layer into the underlying thin film during nanoscale fabrication processes, distinguishing itself by specifically evaluating the smallest feature size and positional accuracy achievable in the transferred pattern.

39

Publications

4.2K

Citations

195

Authors

69

Institutions

Publications per year

2017–2026

7

Authors

195

  1. SR
    Stephen R. Forrest

    Princeton University, United States

    2 publications · 134 citations

    2

    h-index

  2. AW
    Armin W. Knoll

    IBM Research - Zurich, Switzerland

    2 publications · 133 citations

    2

    h-index

  3. PP
    Peter Peumans

    Stanford University, United States

    2 publications · 134 citations

    2

    h-index

  4. JK
    Joel K. W. Yang

    Singapore University of Technology and Design, Singapore

    2 publications · 116 citations

    2

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  5. JB
    Jay B. Benziger

    Princeton University, United States

    2 publications · 134 citations

    2

    h-index

1–5 of 195

Venues

  1. 6

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  2. Advanced Functional Materials

    3 publications · 176 citations

    3

    h-index

  3. 3

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  4. Nanotechnology

    2 publications · 103 citations

    2

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  5. Microelectronic Engineering

    2 publications · 59 citations

    2

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1–5