Pattern Transfer Resolution
Pattern Transfer Resolution is a metric that quantifies the fidelity with which a designed pattern is accurately replicated from a resist or mask layer into the underlying thin film during nanoscale fabrication processes, distinguishing itself by specifically evaluating the smallest feature size and positional accuracy achievable in the transferred pattern.
39
Publications
4.2K
Citations
195
Authors
69
Institutions
Publications per year
2017–2026
7
Parents
39
Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography
Colin Rawlings, Heiko Wolf, Martin Spieser et al. · ACS Nano · 2017 · 110 citations · Full text
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Singapore University of Technology and Design, Singapore
2 publications · 116 citations
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2
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1–5 of 195
69
IMEC
Leuven, Belgium
3 h-index
19 publications
332 citations
Princeton University
Princeton, United States
3 h-index
10 publications
1.2K citations
IBM Research - Zurich
Rüschlikon, Switzerland
2 h-index
8 publications
706 citations
Paul Scherrer Institute
Villigen, Switzerland
2 h-index
8 publications
256 citations
SwissLitho (Switzerland)
Zurich, Switzerland
2 h-index
4 publications
353 citations
Agency for Science, Technology and Research
Singapore, Singapore
1 h-index
3 publications
207 citations
Samsung (South Korea)
Seoul, South Korea
1 h-index
2 publications
34 citations
Shipley Hospital
Shipley, United Kingdom
1 h-index
2 publications
84 citations
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6 publications · 627 citations
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3 publications · 176 citations
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3 publications · 73 citations
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2 publications · 103 citations
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2 publications · 59 citations
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