Tapered Etch Profiles

Tapered Etch Profile is an etching characteristic in bulk micromachining defined by a non-vertical sidewall geometry resulting from directional or chemical etching processes, distinguished by a gradual width variation along the etched feature’s depth.

26

Publications

682

Citations

120

Authors

31

Institutions

Publications per year

2017–2026

2

Authors

120

  1. KY
    Ki‐Yeon Yang

    Korea University, South Korea

    1 publications · 19 citations

    1

    h-index

  2. JT
    J. T. C. Lee

    1 publications · 61 citations

    1

    h-index

  3. HL
    Hong-Ji Lee

    Macronix International (Taiwan), Taiwan

    1 publications · 12 citations

    1

    h-index

  4. HL
    Hyoyoung Lee

    Sungkyunkwan University, South Korea

    1 publications · 61 citations

    1

    h-index

  5. RA
    R. A. Lasell

    Old Dominion University, United States

    1 publications · 15 citations

    1

    h-index

1–5 of 120

Venues

  1. 5

    h-index

  2. Japanese Journal of Applied Physics

    JJAP · 3 publications · 77 citations

    3

    h-index

  3. 3

    h-index

  4. Journal of The Electrochemical Society

    JES · 2 publications · 90 citations

    2

    h-index

  5. IEEE Photonics Technology Letters

    IPTEL · 1 publications · 15 citations

    1

    h-index

1–5