Tapered Etch Profiles
Tapered Etch Profile is an etching characteristic in bulk micromachining defined by a non-vertical sidewall geometry resulting from directional or chemical etching processes, distinguished by a gradual width variation along the etched feature’s depth.
26
Publications
682
Citations
120
Authors
31
Institutions
Publications per year
2017–2026
2
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26
M. A. Vyvoda, Hyoyoung Lee, M. V. Malyshev et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 61 citations
Mutumi Tuda, Kenji Shintani, Hiroki Ootera · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2001 · 47 citations
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31

Tohoku University
Sendai, Japan
2 h-index
5 publications
160 citations
Georgia Institute of Technology
Atlanta, United States
2 h-index
4 publications
123 citations
Jeonbuk National University
Jeonju, South Korea
2 h-index
4 publications
62 citations
Semiconductor Research Corporation
Durham, United States
1 h-index
6 publications
84 citations
Social Service Sericulture Project Trust
Dindigul, India
1 h-index
1 publications
72 citations
Sungkyunkwan University
Seoul, South Korea
1 h-index
6 publications
210 citations
Vels University
Chennai, India
1 h-index
1 publications
72 citations
Toshiba (Japan)
Tokyo, Japan
1 h-index
5 publications
215 citations
1–8 of 31
5 publications · 157 citations
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JJAP · 3 publications · 77 citations
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3 publications · 40 citations
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JES · 2 publications · 90 citations
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IPTEL · 1 publications · 15 citations
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