SiO₂ Tapered Etching Employing Magnetron Discharge of Fluorocarbon Gas

Tokuhisa Ohiwa, Keiji Horioka, T. Arikado, +2

Japanese Journal of Applied Physics

Materials ScienceMaterials EngineeringElectrical EngineeringFluorocarbon GasSio 2 +13

The system NiAl2O4Ni2SiO4 at high pressures and temperatures: Spinelloids with spinel-related structures

Masaki Akaogi, Syun‐iti Akimoto, Keiji Horioka, +2

Journal of Solid State Chemistry

Single Silicon Etching Profile Simulation

T. Arikado, Keiji Horioka, Makoto Sekine, +2

Japanese Journal of Applied Physics

EngineeringElectron-beam LithographyMechanical EngineeringSilicon On InsulatorBeam Lithography +15

The Crystal Structure of Bis(acetylacetonato)platinum(II)

Shigeki Onuma, Keiji Horioka, Hironao Inoue, +1

Bulletin of the Chemical Society of Japan

Chelating LigandsInorganic ChemistryCrystal StructureEngineeringNatural Sciences +8

Structure of nickel aluminosilicate (phase IV): a high-pressure phase related to spinel

Keiji Horioka, K. Takahashi, Nobuyuki Morimoto, +3

Acta Crystallographica Section B

Materials ScienceHigh-pressure PhaseMaterials EngineeringEngineeringPhase Equilibrium +5

A New High-Density Plasma Etching System Using A Dipole-Ring Magnet

Makoto Sekine, Masaki Narita, Keiji Horioka, +2

Japanese Journal of Applied Physics

MagnetismElectrical EngineeringPlasma ElectronicsNew High-density PlasmaEngineering +12

Beam induced deposition of an ultraviolet transparent silicon oxide film by focused gallium ion beam

Masataka Ogasawara, Mitsuyo Kariya, Hiroko Nakamura, +12

Applied Physics Letters

Optical MaterialsEngineeringSilicon OxideOptoelectronic DevicesIntegrated Circuits +18

High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether

Yasuhiko Chinzei, Yannick Feurprier, M. Ozawa, +4

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

EngineeringHigh Resist SelectivityHfe 227Vacuum DeviceChemistry +18

Inelastic Low Energy Electron Diffraction Measurements of Hydrogen Adsorbed Si (001) Surfaces: 2×1:H and 1×1: :2H

Shigemitsu Maruno, Hiroshi Iwasaki, Keiji Horioka, +2

Japanese Journal of Applied Physics

Materials ScienceSemiconductorsSurface CharacterizationEngineeringCrystalline Defects +12

Structure of nickel aluminosilicate (phase V): a high-pressure phase related to spinel

Keiji Horioka, M. Nishiguchi, N. Morimoto, +3

Acta Crystallographica Section B

Materials EngineeringHigh-pressure PhaseMaterials ScienceEngineeringPhase V +6