Step Imprint Lithography

Step Imprint Lithography is a nanoimprint lithography technique that belongs to the class of serial patterning methods, distinguished by its localized, step-by-step application of pressure and replication of nanoscale features on a substrate through a rigid mold, enabling high-resolution pattern transfer over discrete areas in a controllable and repeatable manner.

68

Publications

2.8K

Citations

184

Authors

42

Institutions

Publications per year

2017–2026

0

Publications

68

1–5 of 68

Authors

184

  1. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    26 publications · 1.7K citations

    22

    h-index

  2. JG
    John G. Ekerdt

    The University of Texas at Austin, United States

    14 publications · 1.1K citations

    14

    h-index

  3. SV
    S. V. Sreenivasan

    The University of Texas at Austin, United States

    18 publications · 1.1K citations

    14

    h-index

  4. DJ
    Douglas J. Resnick

    Motorola (United States), United States

    19 publications · 613 citations

    14

    h-index

  5. KJ
    Kevin J. Nordquist

    Motorola (United States), United States

    13 publications · 510 citations

    11

    h-index

1–5 of 184