Step Imprint Lithography
Step Imprint Lithography is a nanoimprint lithography technique that belongs to the class of serial patterning methods, distinguished by its localized, step-by-step application of pressure and replication of nanoscale features on a substrate through a rigid mold, enabling high-resolution pattern transfer over discrete areas in a controllable and repeatable manner.
68
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2.8K
Citations
184
Authors
42
Institutions
Publications per year
2017–2026
0
Parents
68
Imprint lithography for integrated circuit fabrication
Douglas J. Resnick, William J. Dauksher, David P. Mancini et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 121 citations
Engineering, Manufacturing Engineering, Materials Science +10
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The University of Texas at Austin
Austin, United States
23 h-index
167 publications
11.7K citations
Motorola (United States)
Schaumburg, United States
13 h-index
81 publications
3.2K citations

VTT Technical Research Centre of Finland
Espoo, Finland
4 h-index
9 publications
272 citations
AGH University of Krakow
Krakow, Poland
3 h-index
10 publications
203 citations
Cardiff University
Cardiff, United Kingdom
3 h-index
11 publications
163 citations
Physical Sciences (United States)
Andover, United States
2 h-index
16 publications
1K citations
University of Houston
Houston, United States
2 h-index
4 publications
482 citations
Sprint (United States)
Overland Park, United States
2 h-index
15 publications
219 citations
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15 publications · 1.1K citations
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21 publications · 413 citations
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9 publications · 282 citations
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3 publications · 137 citations
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3 publications · 115 citations
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