Concepedia

Photoresist Development

Photoresist Development is a lithographic process step in which a soluble component of an irradiated photoresist film is selectively removed by a chemical developer, thereby transferring the latent pattern formed by exposure into a physical relief structure on the substrate.

226

Publications

9.2K

Citations

840

Authors

219

Institutions

Publications per year

2017–2026

34

Parents

Publications

226

SU-8: a low-cost negative resist for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Journal of Micromechanics and Microengineering · 1997 · 972 citations · Full text

, , +11

Characterization of positive photoresist

F.H. Dill, W.P. Hornberger, P.S. Hauge et al. · IEEE Transactions on Electron Devices · 1975 · 422 citations

, , +9

Accelerating materials discovery using artificial intelligence, high performance computing and robotics

Edward O. Pyzer‐Knapp, Jed W. Pitera, Peter Staar et al. · npj Computational Materials · 2022 · 387 citations · Full text

, , +15

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 339 citations

, , +14

Modeling projection printing of positive photoresists

F.H. Dill, Andrew R. Neureuther, Joshua Tuttle et al. · IEEE Transactions on Electron Devices · 1975 · 232 citations

, , +12

1–5 of 226

Authors

840

  1. CK
    Christopher K. Ober

    Cornell University, United States

    15 publications · 410 citations

    12

    h-index

  2. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    14 publications · 308 citations

    12

    h-index

  3. MU
    Mitsuru Ueda

    Tokyo Institute of Technology, Japan

    9 publications · 422 citations

    9

    h-index

  4. WD
    William D. Hinsberg

    IBM Research - Almaden, United States

    7 publications · 172 citations

    7

    h-index

  5. RR
    Ralph R. Dammel

    The University of Texas at Austin, United States

    7 publications · 118 citations

    7

    h-index

1–5 of 840

Institutions

219

  1. Cornell University

    Ithaca, United States

    12 h-index

    59 publications

    1.7K citations

  2. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    10 h-index

    20 publications

    5.5K citations

  3. IBM (United States)

    Armonk, United States

    10 h-index

    34 publications

    7.1K citations

  4. The University of Texas at Austin

    Austin, United States

    10 h-index

    41 publications

    945 citations

  5. IBM Research - Almaden

    San Jose, United States

    8 h-index

    32 publications

    1.5K citations

  6. MIT Lincoln Laboratory

    Lexington, United States

    8 h-index

    37 publications

    1K citations

  7. University of California, Berkeley

    Berkeley, United States

    8 h-index

    25 publications

    1.3K citations

  8. Korea Advanced Institute of Science and Technology

    Daejeon, South Korea

    6 h-index

    21 publications

    542 citations

1–8 of 219

Venues

  1. 18

    h-index

  2. Journal of Photopolymer Science and Technology

    16 publications · 318 citations

    12

    h-index

  3. Chemistry of Materials

    10 publications · 361 citations

    10

    h-index

  4. 9

    h-index

  5. 7

    h-index

1–5