H. Lorenz - Concepedia

Concepedia

Author

H. Lorenz

École Polytechnique Fédérale de Lausanne

Also Known As

H Lorenz, H. Lorenz, Hubert Lorenz, Lorenz, Hubert

18

Publications

2.6K

Citations

15

H-Index

43

Concepts

All Affiliations

École Polytechnique Fédérale de Lausanne IBM Research - Zurich University of Neuchâtel IBM (United States)

HL

About

H. Lorenz is an author at École Polytechnique Fédérale de Lausanne specializing in engineering, microfabrication, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	13	1.6K
2	Applied Physics	3	3	740
3	Natural Sciences	1	1	35
4	Biomedical Engineering	1	1	69
5	Biomolecular Engineering	1	1	34

H. Lorenz

×

15

Publications

2.6K

Citations

15

H-Index

	Year	Citations
SU-8: a low-cost negative resist for MEMS H. Lorenz, M. Despont, N. Fahrni, Journal of Micromechanics and Microengineering	1997	967
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS H. Lorenz, M. Despont, N. Fahrni, Sensors and Actuators A Physical Materials SciencePhotonicsImage SensorEngineeringMicrofabrication	1998	572
Mechanical characterization of a new high-aspect-ratio near UV-photoresist H. Lorenz, M. Laudon, Philippe Renaud Microelectronic Engineering Materials ScienceEngineeringMechanical PropertiesMicrofabricationMechanics	1998	191
3D microfabrication by combining microstereolithography and thick resist UV lithography Arnaud Bertsch, H. Lorenz, Philippe Renaud Sensors and Actuators A Physical Materials ScienceEngineeringMicrofabricationMechanical EngineeringFabrication Technique	1999	174
Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist H. Lorenz, M. Despont, P. Vettiger, Microsystem Technologies Materials ScienceEngineeringSu-8 Uv ResistMicrofabricationMechanical Engineering	1998	149
High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications M. Despont, H. Lorenz, N. Fahrni, EngineeringElectron-beam LithographyMechanical EngineeringNegative-tone Near-uv PhotoresistMicro-optical Component	2002	133
Combining microstereolithography and thick resist UV lithography for 3D microfabrication Arnaud Bertsch, H. Lorenz, Philippe Renaud Materials ScienceEngineeringBeam LithographyMicrofabricationDigital Fabrication	2002	69
Fabrication process of high aspect ratio elastic structures for piezoelectric motor applications L. Dellmann, S. Roth, C. Beuret, EngineeringPiezoelectric Motor ApplicationsMechanical EngineeringMicroactuatorMechanics	2002	63
Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications L. Dellmann, S. Roth, C. Beuret, Sensors and Actuators A Physical Materials ScienceEngineeringPiezoelectric Motor ApplicationsMicrofabricationPiezoelectric Nanogenerators	1998	61
Low-cost technology for multilayer electroplated parts using laminated dry film resist H. Lorenz, L. Paratte, R. Luthier, Sensors and Actuators A Physical Materials ScienceElectrical EngineeringEngineeringFlexible ElectronicsMicrofabrication	1996	45

Page 1