Pattern Defect Reduction
Pattern Defect Reduction is a methodological framework in thin-film patterning that systematically minimizes deviations from intended pattern geometries by identifying, analyzing, and mitigating sources of defects during fabrication processes.
63
Publications
1.9K
Citations
390
Authors
88
Institutions
Publications per year
2017–2026
6
Parents
63
Florian Tendille, P. de Mierry, P. Vennéguès et al. · Journal of Crystal Growth · 2014 · 65 citations
Nanoimprint lithography for semiconductor devices and future patterning innovation
Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations · Full text
Engineering, Manufacturing Engineering, Materials Science +10
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The University of Osaka
Osaka, Japan
4 h-index
4 publications
113 citations
IMEC
Leuven, Belgium
4 h-index
21 publications
686 citations
Synopsys (United States)
Mountain View, United States
3 h-index
4 publications
104 citations
KU Leuven
Leuven, Belgium
3 h-index
3 publications
83 citations
Intel (United States)
Santa Clara, United States
3 h-index
17 publications
307 citations
IBM (United States)
Armonk, United States
3 h-index
14 publications
189 citations
SunEdison (United States)
Belmont, United States
3 h-index
7 publications
217 citations

GlobalFoundries (United States)
Santa Clara, United States
3 h-index
8 publications
138 citations
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23 publications · 553 citations
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7 publications · 248 citations
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JJAP · 3 publications · 91 citations
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2 publications · 30 citations
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1 publications · 49 citations
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