Concepedia

Line Width Roughness Analysis

Line Width Roughness Analysis is a metrological characterization technique used in microfabrication that quantifies the sub-wavelength-scale deviations in the edge position of patterned features along their intended contour to assess lithographic process fidelity and feature uniformity.

78

Publications

1.8K

Citations

295

Authors

76

Institutions

Publications per year

2017–2026

12

Variants

Lwr Analysis

Parents

Publications

78

Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Applied Physics Express · 2010 · 106 citations

, , +13

Aerosol jet printing of PEDOT:PSS for large area flexible electronics

Giuseppe Tarabella, Davide Vurro, Stefano Lai et al. · Flexible and Printed Electronics · 2019 · 86 citations

, , +14

Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2011 · 73 citations

, , +15

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

, , +13

Technological merits, process complexity, and cost analysis of self-aligned multiple patterning

Yijian Chen, Qi Cheng, Weiling Kang · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 50 citations

, , +15

1–5 of 78

Authors

295

  1. GF
    Gian F. Lorusso

    IMEC, Belgium

    6 publications · 105 citations

    6

    h-index

  2. TK
    Takahiro Kozawa

    The University of Osaka, Japan

    6 publications · 283 citations

    6

    h-index

  3. TI
    Toshiro Itani

    The University of Osaka, Japan

    5 publications · 230 citations

    5

    h-index

  4. ST
    Seiichi Tagawa

    The University of Osaka, Japan

    5 publications · 261 citations

    5

    h-index

  5. LH
    Leonardus H. A. Leunissen

    IMEC, Belgium

    5 publications · 86 citations

    5

    h-index

1–5 of 295

Institutions

76

  1. IMEC

    Leuven, Belgium

    13 h-index

    44 publications

    810 citations

  2. Intel (United States)

    Santa Clara, United States

    8 h-index

    24 publications

    464 citations

  3. National Institute of Standards and Technology

    Gaithersburg, United States

    6 h-index

    17 publications

    195 citations

  4. The University of Osaka

    Osaka, Japan

    6 h-index

    14 publications

    610 citations

  5. Centre National de la Recherche Scientifique

    Paris, France

    5 h-index

    16 publications

    423 citations

  6. Hitachi (Japan)

    Tokyo, Japan

    5 h-index

    16 publications

    467 citations

  7. Commissariat à l'Énergie Atomique et aux Énergies Alternatives

    Paris, France

    5 h-index

    18 publications

    480 citations

  8. Laboratoire d'Électronique des Technologies de l'Information

    Grenoble, France

    5 h-index

    15 publications

    387 citations

1–8 of 76

Venues

  1. 15

    h-index

  2. 8

    h-index

  3. 5

    h-index

  4. 5

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 4 publications · 135 citations

    4

    h-index

1–5